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Quartz Sputtering Targets

Quartz Sputtering Targets

-- Steady & Reliable Manufacturer --

Introduction

Quartz Sputtering Targets are high-purity, disc- or plate-shaped source materials used in thin-film deposition processes, specifically via RF (Radio Frequency) sputtering. The target, made of fused silica (SiO2​), is bombarded with energetic ions (typically Argon), causing atoms of SiO2​ to be ejected and deposited as a thin, highly uniform film onto a substrate (e.g., glass, silicon). Yancheng Mingyang Quartz Products Co., Ltd. supplies sputtering targets made from ultra-high purity fused silica, often JGS1 grade synthetic quartz, to ensure the deposited film is free of performance-degrading contaminants like alkali metals (Na, K). These targets are critical for the production of transparent conductive films, anti-reflective coatings, optical filters, and SiO2​ insulating layers in advanced electronic and optical devices.

The quality of the sputtering target directly determines the quality of the deposited film. We ensure the quartz material is dense, uniform, and has minimal internal voids or bubbles, which prevents "spitting" during the sputtering process—a phenomenon that deposits particulate defects onto the substrate, reducing device yield. The targets are precision-ground and polished to meet demanding dimensional tolerances, ensuring excellent thermal contact and fit into the sputtering system's cathode assembly. A crucial service we provide is Target Bonding: permanently joining the fragile quartz target to a metallic backing plate (e.g., Copper, Molybdenum) using high-thermal-conductivity epoxy or indium solder. This backing plate is necessary to mechanically mount the target and efficiently draw heat away from the sputtering zone, which is vital for maintaining a stable deposition rate and preventing target fracture. We offer targets in circular (discs) and rectangular (plates) geometries, including complex rotary sputtering targets (cylinders) for high-volume roll-to-roll processing. The high chemical inertness and wide bandgap of quartz make the sputtered SiO2​ films excellent insulators and protective layers for display and semiconductor applications.

By providing ultra-high purity, dimensionally precise, and expertly bonded quartz sputtering targets, we support the fabrication of high-performance thin films for the electronics and optics industries.

Specification Parameters

ParameterDetails
Material GradeUltra-High Purity Fused Silica (SiO2​), often JGS1 Synthetic Quartz
Target PurityCritical: <5 ppm total metallic impurities (often sub-ppb for key elements)
GeometryCircular Discs (up to 400 mm OD), Rectangular Plates, Rotary Cylinders
Density/Void ContentHigh density, <0.1% porosity, zero visible bubbles
Dimensional ToleranceTight ±0.1 mm on diameter/length, high flatness for bonding
Bonding MaterialHigh Thermal Conductivity Epoxy or Indium Solder (for high-power applications)
Backing Plate MaterialCopper (OFHC), Molybdenum, or Stainless Steel
Post-ProcessingCleaning, Vacuum Sealing, QC Inspection (Ultrasonic for bonding integrity)

The critical technical factor for Quartz Sputtering Targets is achieving Ultra-High Purity with minimal trace elements. Metallic impurities in the target will be transferred directly to the thin film, causing leakage or poor electrical performance in semiconductors and display panels. We primarily use Synthetic Fused Silica (JGS1) which offers the cleanest SiO2​ source material. Density/Void Content is also vital; a target with internal pores or bubbles is prone to catastrophic fracture under the thermal and ion stress of sputtering, leading to system downtime and contamination. We verify bonding integrity using Ultrasonic Testing to ensure there are no voids in the thermal interface between the quartz and the backing plate. The Target Bonding process is specialized; Indium is often used for high-power sputtering because it provides an excellent thermal and mechanical interface that can withstand high temperatures without degradation. We match the bonding and backing plate materials to the client's sputtering system and process parameters (e.g., RF power density) to optimize target utilization and minimize the risk of thermal runaway. The precision grinding ensures maximum surface area contact for both the sputtering and the cooling side.

Applications

  • Semiconductor Thin Films: Depositing high-quality SiO2​ films for insulating layers, gate dielectrics, and passivation layers on silicon wafers.

  • Flat Panel Displays (LED/OLED): Used for sputtering insulating and barrier layers that protect the active electronic components in high-resolution screens.

  • Optical Coating Fabrication: Depositing highly uniform SiO2​ layers for anti-reflective (AR), highly reflective (HR), and band-pass optical filters on lenses and windows.

  • Photovoltaic (Solar) Cells: Sputtering protective or anti-reflective coatings onto large area solar panels to enhance light collection and durability.

  • Surface Acoustic Wave (SAW) Devices: Used for creating the thin-film piezoelectric layers in high-frequency filter components.

  • Protective Coatings: Depositing durable, chemically resistant SiO2​ protective layers onto various substrates.

The use of quartz sputtering targets is central to producing high-quality electronic and optical thin films with tight control over stoichiometry and film purity. Our expertise in target bonding is a significant differentiator, ensuring that the fragile quartz is safely integrated into the high-power, thermally stressed sputtering environment. By providing highly utilized targets (minimal unused "racetrack" area) and maximizing the target's life through superior bonding, we help clients reduce their material and maintenance costs. We offer full material CoA reports, including detailed trace element analysis, giving the thin-film engineer confidence in the source material. We handle the entire process from quartz purification to final bonding and QC, simplifying the supply chain for thin-film fabrication companies.

Advantages

  • Film Purity Assurance: Ultra-high purity JGS1 quartz minimizes contaminant transfer, crucial for high-performance electronic and optical films.

  • High Thermal Dissipation: Expert bonding to OFHC Copper backing plates maximizes heat transfer, preventing target overheating, cracking, and process instability.

  • Dimensional Precision: Targets are precision-ground for optimal fit and uniform material erosion in the sputtering chamber.

  • Reduced Spitting: High material density and minimal internal voids prevent particulate defects in the deposited thin film, increasing device yield.

  • Variety of Geometries: Available in standard discs, rectangles, and custom rotary cylinders for various sputtering system types.

  • Full Quality Control: Ultrasonic testing verifies bond integrity; ICP-MS verifies material purity.

The key advantage is delivering a complete, high-performance sputtering source that guarantees film quality and maximizes the time between target replacements. We simplify the client's process by managing the complex bonding procedure, which is often the failure point of quartz targets in high-power systems.

Payment and Shipping

We accept standard payments (T/T, L/C). Due to the high value of bonded targets, specific payment terms and volume contracts are negotiated on a case-by-case basis. We also offer recycling/rebonding services for used targets.

Shipping Protocol for Sputtering Targets: Protection from contamination and mechanical shock.

  • Vacuum Packaging: Targets are cleaned to ultra-high standards and typically vacuum-sealed in foil bags to prevent surface contamination prior to installation in a cleanroom.

  • Custom Carriers: Targets are secured in rigid, custom-cut foam or plastic carriers designed to protect the fragile quartz material and the precision-ground mounting surfaces.

  • Freight: Shipped via air freight to minimize transit time. All relevant purity and bonding certification documentation is included.

Lead times for standard quartz targets are 3−4 weeks. Custom geometries or targets requiring complex Indium bonding can extend lead times to 6−10 weeks.

Frequently Asked Questions (FAQ)

  • Q: What is the benefit of bonding a quartz target to a copper plate?

  • A: Bonding is essential because quartz is an electrical insulator and a poor thermal conductor. The metal backing plate provides electrical conductivity for the RF signal and, more importantly, efficiently conducts the immense heat generated by the ion bombardment away to the system's cooling fluid, preventing target fracture.

  • Q: Why is synthetic fused silica preferred over natural quartz for sputtering?

  • A: Synthetic fused silica (like JGS1) has far lower levels of metallic impurities (especially Na, K) than natural quartz. These impurities would contaminate the deposited film, which is unacceptable for high-performance electronic devices.

  • Q: What is a "rotary" sputtering target?

  • A: A rotary target is a cylindrical sputtering source (often long, large diameter quartz tube) that rotates during deposition. This allows for higher power density, better target material utilization, and longer life than conventional planar disc targets, making them ideal for high-throughput coating lines.

  • Q: How does a quartz target differ from a silicon target?

  • A: A quartz target deposits SiO2​ (silicon dioxide), an excellent insulator. A silicon target deposits pure Si (silicon), a semiconductor. They serve entirely different functional purposes in the device structure.

From Made-in-China to
Global Smart Manufacturing

Yancheng Mingyang Quartz Products Co., Ltd. is a company specializing in the production of quartz and special glass products. Yancheng Mingyang Quartz Products Co., Ltd. is the production plant of Jinzhou Mingde Quartz Glass Co., Ltd. in Jiangsu, Since its establishment, the company has developed rapidly, introduced advanced technology and production equipment at home and abroad, and continuously improved and improved product quality. Relying on its own advantages, we have developed a variety of products suitable for the market and meet the needs of different customers, and solved many urgent production problems for our customers.

The company's products include quartz glass tubes, double-hole quartz glass tubes, quartz glass rods, quartz sheets, sapphire windows, calcium fluoride glass windows, infrared ultraviolet coatings, high-pressure resistant aluminosilicate glass window panels, quartz glass instruments, high borosilicate glass instruments, quartz crucibles, quartz gold-plated tubes, quartz heaters, quartz infrared heating tubes, far-infrared directional radiation heaters ultraviolet germicidal lamps and other special types of quartz glass products.

Yancheng Mingyang Quartz Products Co., Ltd.
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